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chapter 2, EUV Source Requirements for EUV Lithography

In Section I: Introduction and Technology Review from: EUV Sources for Lithography
Editor(s): Vivek Bakshi
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Author(s): Kazuya Ota, Yutaka Watanabe, Vadim Banine, Hans Franken
Published: 23 February 2006
Chapter Page Count: 17 pages

Table of Contents

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Chapter Contents

  • 2.1 Introduction and Background
  • 2.2 Source Requirements
  • 2.3 Component Degradation
  • 2.4 Cost of Ownership
  • 2.5 Conclusions
  • Acknowledgments
  • References

Excerpt

2.1 Introduction and Background

2.1.1 Joint specifications

Joint specifications for EUV sources were first presented by ASML, Canon, and Nikon in February 2002 to accelerate source development by source suppliers, and the joint specifications have been updated periodically. The latest requirements are shown in Table 2.1, which was presented at the EUV Source Workshop in Miyazaki (Japan) on November 5, 2004.

These specifications are defined at∕after the intermediate focus (IF), which is explained in the next subsection. Table 2.2 shows how major requirements changed from 2002 to 2004. Requirements for wavelength, EUV inband power, and etendue of source output were agreed on at the workshop, but requirements for repetition frequency and maximum solid angle input to illuminator are not yet agreed on, because they depend on the tool design.

2.1.2 Definition of EUV source

Two kinds of plasmas emit EUV light: laser-produced plasma (LPP) and gas-discharge plasma (GDP). There are various types of GDPs according to the arrangement of the electrodes. Furthermore, several materials (Xe, Sn, etc.) are used for the plasma. Thus, even if only the plasma is considered, there are many potential candidates for the EUV source to be used for high-volume manufacturing (HVM). Collector optics is used to collect EUV light that radiates from the plasma and to focus the light at the IF. There are two kinds of mirror for the collector: the normal-incidence multilayer mirror and the grazing-incidence total-reflection mirror. Furthermore, there are many types of collector that are being developed.



©2006 Society of Photo-Optical Instrumentation Engineers
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BOOK DATA

Print ISBN:

9780819458452

Print ISBN:

0819458457

eISBN:

9780819480712

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