Front Matter

Table of Contents

• Front Matter

• Section I: Introduction and Technology Review
• 1. EUV Source Technology: Challenges and Status

• 2. EUV Source Requirements for EUV Lithography

• Section II: Fundamentals and Modeling
• 3. Atomic Xenon Data

• 4. Atomic Tin Data

• 5. Atomic Physics of Highly Charged Ions and the Case for Sn as a Source Material

• 6. Radiative Collapse in Z Pinches

• 7. Fundamentals and Limits of Plasma-Based EUV Sources

• 8. Z* Code for DPP and LPP Source Modeling

• 9. HEIGHTS-EUV Package for DPP Source Modeling

• 10. Modeling LPP Sources

• 11. Conversion Efficiency of LPP Sources

• Section III: Plasma Pinch Sources
• 12. Dense Plasma Focus Source

• 13. Hollow-Cathode-Triggered Plasma Pinch Discharge

• 14. High-Power GDPP Z-Pinch EUV Source Technology

• 15. Star Pinch EUV Source

• 16. Xenon and Tin Pinch Discharge Sources

• 17. Capillary Z-Pinch Source

• 18. Plasma Capillary Source

• Section IV: Laser-Produced Plasma (LPP) Sources
• 19. Technology for LPP Sources

• 20. Spatially and Temporally Multiplexed Laser Modules for LPP Sources

• 21. Modular LPP Source

• 22. Driver Laser, Xenon Target, and System Development for LPP Sources

• 23. Liquid-Xenon-Jet LPP Source

• 24. LPP Source Development and Operation in the Engineering Test Stand

• 25. Xenon Target and High-Power Laser Module Development for LPP Sources

• 26. Laser Plasma EUV Sources Based on Droplet Target Technology

• Section V: EUV Source Metrology
• 27. Flying Circus EUV Source Metrology and Source Development Assessment

• 28. Plasma Diagnostic Techniques

• 29. Metrology for EUVL Sources and Tools

• 30. Calibration of Detectors and Tools for EUV-Source Metrology

• Section VI: Other Types of EUV Sources
• 31. Electron-Based EUV Sources for At-Wavelength Metrology

• 32. Synchrotron Radiation Sources for EUVL Applications

• Section VII: EUV Source Components
• 33. Grazing-Incidence EUV Collectors

• 34. Collection Efficiency of EUV Sources

• 35. Electrode and Condenser Materials for Plasma Pinch Sources

• 36. Origin of Debris in EUV Sources and Its Mitigation

• 37. Erosion of Condenser Optics Exposed to EUV Sources

• 38. Potential Energy Sputtering of EUVL Materials

• Back Matter