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Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern
J. Micro/Nanolith. MEMS MOEMS 10, 043011 (Nov 29, 2011); http://dx.doi.org/10.1117/1.3658022
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Add to FacebookForbidden pitches that are introduced under certain illumination conditions can have extremely narrow depth of focus (DOF), so that when a lithographic pattern is transferred to a wafer, the forbidden pitch should be removed from the layout. However, the sensitivity of this narrow DOF can be utilized to monitor focus changes in the scanner system itself. In this paper, a newly developed focus monitoring method utilizing the forbidden pitches is introduced and the sensitivity and advantages of this method are discussed in detail.
© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)
History
Received Apr 10, 2011
Accepted Oct 13, 2011
Revised Aug 07, 2011
Published online Nov 29, 2011
Accepted Oct 13, 2011
Revised Aug 07, 2011
Published online Nov 29, 2011
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Citation
Jinseok Heo, Jeong-Ho Yeo and Younghee Kim, "Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern",
J. Micro/Nanolith. MEMS MOEMS 10, 043011 (Nov 29, 2011); http://dx.doi.org/10.1117/1.3658022
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