Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects

Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.

doi:doi:10.1117/1.3647513

GENERAL INFORMATION

Journal of Micro/Nanolithography, MEMS, and MOEMS / Volume 10 / Issue 4 / Errata

J. Micro/Nanolith. MEMS MOEMS 10, 049801 (Oct 26, 2011); http://dx.doi.org/10.1117/1.3647513

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Abstract

Philip C. W. Ng and Kuen-Yu Tsai

National Taiwan University, Department of Electrical Engineering, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan

Lawrence S. Melvin, III

Synopsys, Inc., Silicon Engineering Group, 2025 NW Cornelius Pass Road, Hillsboro, Oregon 97124

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History

Published online Oct 26, 2011

Digital Object Identifier

http://dx.doi.org/10.1117/1.3647513

Citation

Philip C. W. Ng, Kuen-Yu Tsai and III Lawrence S. Melvin, "Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects", J. Micro/Nanolith. MEMS MOEMS 10, 049801 (Oct 26, 2011); http://dx.doi.org/10.1117/1.3647513

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Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
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