How long is ten years?
J. Micro/Nanolith. MEMS MOEMS 10, 040101 (Dec 14, 2011); doi:10.1117/1.3665263
Online Publication Date: Dec 14, 2011
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Analytic form for the power spectral density in one, two, and three dimensions
J. Micro/Nanolith. MEMS MOEMS 10, 040501 (Nov 30, 2011); doi:10.1117/1.3663567
Online Publication Date: Nov 30, 2011
Design, fabrication, and evaluation of vacuum testing of a novel electromagnetic microactuator
J. Micro/Nanolith. MEMS MOEMS 10, 043001 (Oct 04, 2011); doi:10.1117/1.3641412
Online Publication Date: Oct 04, 2011
Fabrication of nanogap electrodes via nano-oxidation mask by scanning probe microscopy nanolithography
J. Micro/Nanolith. MEMS MOEMS 10, 043002 (Oct 04, 2011); doi:10.1117/1.3643480
Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity
J. Micro/Nanolith. MEMS MOEMS 10, 043003 (Oct 06, 2011); doi:10.1117/1.3641409
Online Publication Date: Oct 06, 2011
Fabrication of monolithic polymer nanofluidic channels via near-field electrospun nanofibers as sacrificial templates
J. Micro/Nanolith. MEMS MOEMS 10, 043004 (Oct 21, 2011); doi:10.1117/1.3644990
Online Publication Date: Oct 21, 2011
Mask replication using jet and flash imprint lithography
J. Micro/Nanolith. MEMS MOEMS 10, 043005 (Oct 21, 2011); doi:10.1117/1.3646523
Evaluation of extreme ultraviolet mask defect using blank inspection, patterned mask inspection, and wafer inspection
J. Micro/Nanolith. MEMS MOEMS 10, 043006 (Oct 31, 2011); doi:10.1117/1.3644984
Online Publication Date: Oct 31, 2011
Lossless circuit layout image compression algorithm for maskless direct write lithography systems
J. Micro/Nanolith. MEMS MOEMS 10, 043007 (Nov 08, 2011); doi:10.1117/1.3644620
Online Publication Date: Nov 08, 2011
Nanoimprint lithography and future patterning for semiconductor devices
J. Micro/Nanolith. MEMS MOEMS 10, 043008 (Nov 15, 2011); doi:10.1117/1.3658024
Online Publication Date: Nov 15, 2011
Bonding of polydimethylsiloxane microfluidics to silicon-based sensors
J. Micro/Nanolith. MEMS MOEMS 10, 043009 (Nov 21, 2011); doi:10.1117/1.3659139 | Cited 1 time
Online Publication Date: Nov 21, 2011
Multi-aperture optics for wafer-level cameras
J. Micro/Nanolith. MEMS MOEMS 10, 043010 (Nov 21, 2011); doi:10.1117/1.3659144
Highly sensitive and fast scanner focus monitoring method using forbidden pitch pattern
J. Micro/Nanolith. MEMS MOEMS 10, 043011 (Nov 29, 2011); doi:10.1117/1.3658022
Online Publication Date: Nov 29, 2011
Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
J. Micro/Nanolith. MEMS MOEMS 10, 043012 (Nov 29, 2011); doi:10.1117/1.3659145
Manufacture of carbon microelectrodes by laser lithography for electrochemical detection
J. Micro/Nanolith. MEMS MOEMS 10, 043013 (Dec 01, 2011); doi:10.1117/1.3661993
Online Publication Date: Dec 01, 2011
Wavefront-based pixel inversion algorithm for generation of subresolution assist features
J. Micro/Nanolith. MEMS MOEMS 10, 043014 (Dec 01, 2011); doi:10.1117/1.3663249
Surface modification of extreme-ultraviolet lithography mask blanks by e-beam
J. Micro/Nanolith. MEMS MOEMS 10, 043015 (Dec 08, 2011); doi:10.1117/1.3655725
Online Publication Date: Dec 08, 2011
Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope
J. Micro/Nanolith. MEMS MOEMS 10, 043016 (Dec 15, 2011); doi:10.1117/1.3655726
Online Publication Date: Dec 15, 2011
Improved secondary electron extraction efficiency model for accurate measurement of narrow-space patterns using model-based library matching
J. Micro/Nanolith. MEMS MOEMS 10, 043017 (Dec 22, 2011); doi:10.1117/1.3664410
Online Publication Date: Dec 22, 2011
Controllable fabrication of enclosed micro/nanochannels via polymethyl methacrylate pattern as sacrificial template and capillary effect
J. Micro/Nanolith. MEMS MOEMS 10, 049701 (Dec 14, 2011); doi:10.1117/1.3665215
Errata: Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects
J. Micro/Nanolith. MEMS MOEMS 10, 049801 (Oct 26, 2011); doi:10.1117/1.3647513
Online Publication Date: Oct 26, 2011