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Low-reflectivity wire-grid polarizers multilayered by the glancing-angle-deposition technique
J. Nanophoton. 5, 051501 (Jan 27, 2011); http://dx.doi.org/10.1117/1.3543821
We have examined antireflection (AR) coatings for high reflectivity metals such as Al on the basis of the admittance diagram. The proposed AR coatings consist of bilayers of absorptive and dielectric materials. A wide variety of materials can be used for AR coatings by tuning the thicknesses of both the absorptive and the dielectric layers. The bilayered AR concept has been applied to reduce the reflectance of wire grid (WG) polarizers made of Al. An absorptive FeSi 2 layer has been deposited by the glancing angle deposition technique immediately on the top of Al wires covered with a thin SiO 2 layer. For the optimum combination of the thicknesses of FeSi 2 and SiO 2, the reflectance reduces to lower than a few percent independent of the polarization, whereas the transmission polarization properties remain favorable. We have demonstrated that Ge is also appropriate for the low-reflectivity WG polarizers as an absorptive material. Because low-reflectivity WG polarizers are completely composed of inorganic materials, they are useful for applications requiring thermal durability, such as liquid crystal projection displays.
© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)
History
Received Sep 27, 2010
Accepted Dec 10, 2010
Revised Dec 08, 2010
Published online Jan 27, 2011
Corrected Mar 03, 2011
Accepted Dec 10, 2010
Revised Dec 08, 2010
Published online Jan 27, 2011
Corrected Mar 03, 2011
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Citation
Motofumi Suzuki, Akio Takada, Takatoshi Yamada, Takashi Hayasaka, Kouji Sasaki, Eiji Takahashi and Seiji Kumagai, "Low-reflectivity wire-grid polarizers multilayered by the glancing-angle-deposition technique",
J. Nanophoton. 5, 051501 (Jan 27, 2011); http://dx.doi.org/10.1117/1.3543821
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