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Journal of Nanophotonics / Volume 5 / Special Section on Nanostructured Thin Films: Fabrication, Characterization, and Application

Preparation of nanostructured ultrathin silver layer

J. Nanophoton. 5, 051511 (Mar 17, 2011); http://dx.doi.org/10.1117/1.3562568

Jiří Bulíř, Michal Novotný, Anna Lynnykova, and Ján Lančok

Institute of Physics, ASCR, v.v.i., Na Slovance 2, Prague, Czech Republic

Silver is widely used for fabrication of plasmonic devices because of its unique optical constants. The nanostructure of the Ag layer is mainly influenced during the initial stage of the silver nucleation. Therefore, we focus our attention on studying this stage of silver growth. Nanostructured ultrathin silver layers are prepared by means of magnetron sputtering. The initial stage of the nucleation and the layer growth is studied by optical monitoring, which is based on spectrophotometric measurement of the sample reflectivity. The measured data are compared to a model of layered structure. The noncontinual (Volmer–Weber) mode of the layer nucleation is clearly distinguished in the monitored data. Thus, we are able to estimate the point of noncontinual layer coalescence. The optical data are correlated with in situ monitoring of the electrical resistance. We find that the nucleation mode and resulting nanostructure can be significantly influenced by an ultrathin silver oxide interlayer.

© 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)

History
Received Oct 02, 2010
Accepted Jan 19, 2011
Revised Jan 15, 2011
Published online Mar 17, 2011
Digital Object Identifier
http://dx.doi.org/10.1117/1.3562568
Citation
Jiří Bulíř, Michal Novotný, Anna Lynnykova and Ján Lančok, "Preparation of nanostructured ultrathin silver layer", J. Nanophoton. 5, 051511 (Mar 17, 2011); http://dx.doi.org/10.1117/1.3562568

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