Experiments and analysis on Joule heating effect in field-assisted ion diffusion

Hao, Yinlei; Zheng, Bin; Wang, Hongjian; Zheng, Weiwei; Yang, Jianyi; Jiang, Xiaoqing; Zhou, Qiang; Wang, Minghua

doi:doi:10.1117/1.OE.51.1.014601

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Optical Engineering / Volume 51 / Issue 1 / Integrated Optics

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Experiments and analysis on Joule heating effect in field-assisted ion diffusion

Opt. Eng. 51, 014601 (Feb 09, 2012); http://dx.doi.org/10.1117/1.OE.51.1.014601

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Abstract

References (16)

Citing Articles (1)

Yinlei Hao, Bin Zheng, Weiwei Zheng, Jianyi Yang, Xiaoqing Jiang, Qiang Zhou, and Minghua Wang

Zhejiang University, Department of Information Science & Electronics Engineering, Hangzhou, 310027, China

Hongjian Wang

Zhejiang Nanfang Communication Group, Huzhou, 313009, China

Due to the Joule heating effect induced by the use of an assisting electric field, glass wafer temperature is experimentally found to increase synchronically with the flow of current during the process of field-assisted ion diffusion. A theoretical analysis demonstrates that the amplitude of the glass wafer temperature increase is dictated by competition between two factors, heat generation and heat dissipation. Heat generation and heat dissipation both become stronger as the glass wafer temperature increases. Studies have shown that the Joule heating effect can influence the waveguide manufacturing process profoundly, including aspects such as the stability of ion diffusion, theoretical modeling of the ion-diffusion process, and waveguide depth uniformity over the glass wafer.

History

Received Aug 23, 2011
Accepted Nov 08, 2011
Revised Oct 21, 2011
Published online Feb 09, 2012

Digital Object Identifier

http://dx.doi.org/10.1117/1.OE.51.1.014601

Citation

Yinlei Hao, Bin Zheng, Hongjian Wang, Weiwei Zheng, Jianyi Yang, Xiaoqing Jiang, Qiang Zhou and Minghua Wang, "Experiments and analysis on Joule heating effect in field-assisted ion diffusion", Opt. Eng. 51, 014601 (Feb 09, 2012); http://dx.doi.org/10.1117/1.OE.51.1.014601