Self-assembling materials for lithographic patterning: overview, status, and moving forward

William Hinsberg; Joy Cheng; Ho-Cheol Kim; Daniel P. Sanders

doi:10.1117/12.852230

1 April 2010 Self-assembling materials for lithographic patterning: overview, status, and moving forward

William Hinsberg, Joy Cheng, Ho-Cheol Kim, Daniel P. Sanders

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370G (2010) https://doi.org/10.1117/12.852230
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field.

Citation Download Citation

William Hinsberg, Joy Cheng, Ho-Cheol Kim, and Daniel P. Sanders "Self-assembling materials for lithographic patterning: overview, status, and moving forward", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370G (1 April 2010); https://doi.org/10.1117/12.852230

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