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A new electron beam-addressed reflective spatial light modulator and projection system for HWIL scene generation

Proc. SPIE 5785, 46 (2005); http://dx.doi.org/10.1117/12.602150

Tuesday 29 March 2005
Orlando, FL, USA
Technologies for Synthetic Environments: Hardware-in-the-Loop Testing X
Robert Lee Murrer, Jr.
  • Abstract
Yin Liu and Christian Gutleben

LW Microsystems, Inc. (USA)

We successfully fabricated two lots of micromirror devices. Each device consisted of a fused silica substrate, a substrate grid layer, a micromirror array layer, a dielectric membrane layer, and a top electrode layer (patterned with collector grid and vent hole only). Each micromirror array contained 1920×1536 mirrors, corresponding to resolution of 1920×1536. The process approach was repeatable, and reliable. Optical microscopy showed that the micromirrors were suspended above the glass panel by mirror post regions. The membrane was suspended above the substrate panel and above the array of micromirrors by membrane post regions. Micromirrors were flat and clean.

© 2005 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

History
Online Jun 03, 2005
Citation
Yin Liu and Christian Gutleben, "A new electron beam-addressed reflective spatial light modulator and projection system for HWIL scene generation", Proc. SPIE 5785, 46 (2005); http://dx.doi.org/10.1117/12.602150

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