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Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation

Proc. SPIE 5992, 599216 (2005); http://dx.doi.org/10.1117/12.631696

Monday 3 October 2005
Monterey, California, USA
25th Annual BACUS Symposium on Photomask Technology
J. Tracy Weed, Patrick M. Martin
Sven Burger, Lin Zschiedrich, and Frank Schmidt

Zuse Institute Berlin (Germany) and JCMwave GmbH (Germany)

Roderick Köhle and Christoph Nölscher

Infineon Technologies AG (Germany)

Weimin Gao

Sigma-C Software AG (Germany)

Reinhard März

JCMwave GmbH (Germany) and Infineon Technologies AG (Germany)

An extremely fast time-harmonic finite element solver developed for the transmission analysis of photonic crystals was applied to mask simulation problems. The applicability was proven by examining a set of typical problems and by a benchmarking against two established methods (FDTD and a differential method) and an analytical example. The new finite element approach was up to 100 times faster than the competing approaches for moderate target accuracies, and it was the only method which allowed to reach high target accuracies.

© 2005 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

History
Online Nov 04, 2005
Citation
Sven Burger, Roderick Köhle, Lin Zschiedrich, Weimin Gao, Frank Schmidt, Reinhard März and Christoph Nölscher, "Benchmark of FEM, waveguide and FDTD algorithms for rigorous mask simulation", Proc. SPIE 5992, 599216 (2005); http://dx.doi.org/10.1117/12.631696

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