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Rigorous simulation of 3D masks
Proc. SPIE 6349, 63494Z (2006); doi:10.1117/12.687816
Tuesday 19 September 2006
Monterey, CA, USA
Photomask Technology 2006
Patrick M. Martin, Robert J. Naber
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Add to FacebookWe perform 3D lithography simulations by using a finite-element solver. To proof applicability to real 3D problems we investigate DUV light propagation through a structure of size 9μm x 4μm x 65nm. On this relatively large computational domain we perform rigorous computations (No Hopkins) taking into account a grid of 11 x 21 source points with two polarization directions each. We obtain well converged results with an accuracy of the diffraction orders of about 1%. The results compare well to experimental aerial imaging results. We further investigate the convergence of 3D solutions towards quasi-exact results obtained with different methods.
© 2006 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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Online Oct 20, 2006
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Sven Burger, Roderick Köhle, Lin Zschiedrich, Hoa Nguyen, Frank Schmidt, Reinhard März and Christoph Nölscher, "Rigorous simulation of 3D masks",
Proc. SPIE 6349, 63494Z (2006); doi:10.1117/12.687816
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