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3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method
Proc. SPIE 6617, 66170V (2007); doi:10.1117/12.726236
Monday 18 June 2007
Munich, Germany
Modeling Aspects in Optical Metrology
Harald Bosse, Bernd Bodermann, Richard M. Silver
Rigorous computer simulations of propagating electromagnetic fields have become an important tool for optical metrology and optics design of nanostructured components. As has been shown in previous benchmarks some of the presently used methods suffer from low convergence rates and/or low accuracy of the results and exhibit very long computation times1,2 which makes application to extended 2D layout patterns impractical. We address 3D simulation tasks by using a finite-element solver which has been shown to be superior to competing methods by several orders of magnitude in accuracy and computational time for typical microlithography simulations.2 We report on the current status of the solver, incorporating higher order edge elements, adaptive refinement methods, and fast solution algorithms. Further, we investigate the performance of the solver in the 3D simulation project of light diffraction off an alternating phase-shift contact-hole mask.
© 2007 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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Online Jun 18, 2007
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Sven Burger, Lin Zschiedrich, Frank Schmidt, Roderick Köhle, Thomas Henkel, Bernd Küchler and Christoph Nölscher, "3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method",
Proc. SPIE 6617, 66170V (2007); doi:10.1117/12.726236
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