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Model-based analysis of the limits of optical metrology with experimental comparisons
Proc. SPIE 6617, 66170W (2007); http://dx.doi.org/10.1117/12.726201
Monday 18 June 2007
Munich, Germany
Modeling Aspects in Optical Metrology
Harald Bosse, Bernd Bodermann, Richard M. Silver
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Add to FacebookThis paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) a series of model-to-experiment comparisons. A part of the study will cover improved model-to-theory agreement obtained using our new Scatterfield microscopy technique, which has enabled evaluation of previous unquantified errors. The Scatterfield microscopy technique allows us to step or scan an aperture in a conjugate back focal plane of the objective lens enabling illumination of a narrow cone of incident plane waves at a given primary angle of incidence. A series of angle resolved images or intensity data can be obtained for each angle of illumination.
© 2007 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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Online Jun 18, 2007
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R. M. Silver, R. Attota and E. Marx, "Model-based analysis of the limits of optical metrology with experimental comparisons",
Proc. SPIE 6617, 66170W (2007); http://dx.doi.org/10.1117/12.726201
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