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Benchmark of rigorous methods for electromagnetic field simulations
Proc. SPIE 7122, 71221S (2008); http://dx.doi.org/10.1117/12.801248
Tuesday 7 October 2008
Monterey, CA, USA
Photomask Technology 2008
Hiroichi Kawahira, Larry S. Zurbrick
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Add to FacebookWe have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.
© 2008 COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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Online Oct 17, 2008
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Sven Burger, Lin Zschiedrich, Frank Schmidt, Peter Evanschitzky and Andreas Erdmann, "Benchmark of rigorous methods for electromagnetic field simulations",
Proc. SPIE 7122, 71221S (2008); http://dx.doi.org/10.1117/12.801248
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