Epitaxial growth of β-Ga2O3 was performed on (110) substrate by plasma-assisted molecular beam epitaxy (PAMBE). Investigation of (010) substrates has revealed that (110) facets are revealed the chevron consistent features in reflection high-energy electron diffraction (RHEED) studies, which indicates (110) is a natural plane in β-Ga2O3 and exhibits atomically flat surface after Ga polishing. The growth rate dependence on Ga flux study suggests that the growth rate is not reduced on the (110) plane compared to that of (010). Atomic force microscopy (AFM) shows smooth surface morphology was obtained by growing on (110) substrates.
Vertical β-Ga2O3 Schottky diodes from metal-organic chemical vapor deposition (MOCVD) epitaxy are reported for high-power devices. The field plate Schottky barrier diode (SBD) showed a differential specific on-resistance (Ron,sp) of 0.67 mΩ-cm2 and an average breakdown electric field of 2.28 MV/cm. To the best of our knowledge, this Ron,sp is the lowest among the available vertical β-Ga2O3 SBD reports, and contributed from the high-mobility MOCVD β-Ga2O3 epitaxy. Moreover, the average electric field of 2.28 MV/cm is higher compared to most of the vertical β-Ga2O3 punch-through SBDs. These results suggest that the high-quality MOCVD β-Ga2O3 can be promising for high-power devices.
Sn doping of β-Ga2O3 grown by conventional plasma-assisted molecular beam epitaxy (PAMBE) and via metal oxide catalyzed epitaxy (MOCATAXY) using a supplied indium flux during MBE growth was investigated. Sn doping of (010) β-Ga2O3 via MOCATAXY allowed for sharper doping profiles as well as a wider range of donor concentrations from 4 x 10^16 cm-3 to 2 x 10^19 cm-3 with a maximum Hall mobility of 136 cm2/Vs and a Sn donor level of 77 meV below the conduction band. Expansion of MOCATAXY to (001) β-Ga2O3 also showed improved Hall mobility, growth rates, and smoother films in this orientation.
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