Dr. Byongseog Lee Profile

Dr. Byongseog Lee

at SK Hynix Inc

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 18 March 2016 Paper

Improvement of EUV mix-match overlay for production implementation

Sarohan Park, ByoungHoon Lee, Byong-Seog Lee, Inwhan Lee, Chang-Moon Lim

Proceedings Volume 9776, 97760E (2016) https://doi.org/10.1117/12.2219169

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Error analysis, Double patterning technology, EUV optics, Overlay metrology, Scanners, Particles, Optical parametric oscillators, Lithography

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Proceedings Article | 19 March 2015 Paper

Overlay measurement accuracy enhancement by design and algorithm

Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Tal Itzkovich, Nuriel Amir, Roie Volkovich, Eitan Herzel, Mark Wagner, Mohamed El Kodadi

Proceedings Volume 9424, 94242B (2015) https://doi.org/10.1117/12.2085272

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Signal processing, Process control, Quality measurement, Lithography, Double patterning technology, Photomasks, Uncertainty analysis

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Proceedings Article | 19 March 2015 Paper

Overlay accuracy investigation for advanced memory device

Honggoo Lee, Byongseog Lee, Sangjun Han, Myoungsoo Kim, Wontaik Kwon, Sungki Park, DongSub Choi, Dohwa Lee, Sanghuck Jeon, Kangsan Lee, Roie Volkovich, Tal Itzkovich, Eitan Herzel, Mark Wagner, Mohamed Elkodadi

Proceedings Volume 9424, 94240C (2015) https://doi.org/10.1117/12.2085270

KEYWORDS: Overlay metrology, Metrology, Quality measurement, Signal processing, Image quality, Lithography, Target detection, Semiconducting wafers, Sensors, Etching

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Proceedings Article | 17 March 2015 Paper

Challenges in high-aspect ratio contact (HARC) etching for DRAM capacitor formation

Yongjin Kim, Sangdo Lee, Taewoo Jung, Byoungseok Lee, Nohjung Kwak, Sungki Park

Proceedings Volume 9428, 942806 (2015) https://doi.org/10.1117/12.2087765

KEYWORDS: Etching, Dielectrics, Capacitors, Capacitance, Polymers, Ions, Scanning electron microscopy, Wet etching, Molecules, Yield improvement

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Proceedings Article | 16 April 2011 Paper

A study of an acid-induced defect on chemically amplified photoresist applied to sub-30nm NAND flash memory

Yong-Hyun Lim, Jae-Doo Eom, Woo-Yung Jung, Min-Sik Jang, Byung-Seok Lee, Jin-Woong Kim

Proceedings Volume 7972, 79722W (2011) https://doi.org/10.1117/12.869936

KEYWORDS: Photoresist materials, Oxides, Silicon, Silicon films, Semiconducting wafers, Photoresist developing, Diffusion, Ions, Gases, Chemical reactions

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Proceedings Article | 16 March 2009 Paper

Process step reduction at negative tone spacer patterning technique using developer soluble bottom ARC

Woo-Yung Jung, Jae-Doo Eom, Sung-Min Jeon, Ji-Hyun Lee, Byung-Seok Lee, Jin-Woong Kim

Proceedings Volume 7274, 72740F (2009) https://doi.org/10.1117/12.814020

KEYWORDS: Optical lithography, Chemical mechanical planarization, Photomasks, Etching, Diffusion, Line width roughness, Bridges, Semiconductors, Astronomical imaging, Current controlled current source

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Proceedings Article | 7 March 2008 Paper

Double patterning of contact array with carbon polymer

Woo-Yung Jung, Guee-Hwang Sim, Sang-Min Kim, Choi-Dong Kim, Sung-Min Jeon, Keunjun Kim, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, Hoon-Hee Cho, Ji-Soo Kim

Proceedings Volume 6924, 69240C (2008) https://doi.org/10.1117/12.771092

KEYWORDS: Silicon, Etching, Carbon, Polymers, Optical lithography, Silicon carbide, Coating, Line width roughness, Double patterning technology, System on a chip

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Proceedings Article | 27 March 2007 Paper

Patterning with amorphous carbon spacer for expanding the resolution limit of current lithography tool

Woo-Yung Jung, Sang-Min Kim, Choi-Dong Kim, Guee-Hwang Sim, Sung-Min Jeon, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, Ji-Soo Kim, Lee-Sang Heon

Proceedings Volume 6520, 65201C (2007) https://doi.org/10.1117/12.707275

KEYWORDS: Double patterning technology, Optical lithography, Etching, Carbon, Critical dimension metrology, Polymers, Lithography, Overlay metrology, Manufacturing, Photomasks

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Proceedings Article | 13 March 2006 Paper

Patterning with spacer for expanding the resolution limit of current lithography tool

Woo-Yung Jung, Choi-Dong Kim, Jae-Doo Eom, Sung-Yoon Cho, Sung-Min Jeon, Jong-Hoon Kim, Jae-In Moon, Byung-Seok Lee, Sung-Ki Park

Proceedings Volume 6156, 61561J (2006) https://doi.org/10.1117/12.650991

KEYWORDS: Photomasks, Etching, Critical dimension metrology, Lithography, Oxides, Optical lithography, Chemical mechanical planarization, Resolution enhancement technologies, Semiconductors, Reticles

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Showing 5 of 9 publications

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