Dr. Chun Chieh Han
at Taiwan Mask Corp
SPIE Involvement:
Author
Area of Expertise:
photomask , lithography , semiconductor
Publications (2)

Proceedings Article | 11 November 2022 Presentation
Proceedings Volume PC12293, PC122930G (2022) https://doi.org/10.1117/12.2641684
KEYWORDS: Critical dimension metrology, Reticles, Particles, Chromium, Etching

Proceedings Article | 16 September 2022 Paper
Hsiang Jen Yang, Po Sheng Wang, Chun Chieh Han, Yi Min Lin, Wen Wei Lee, Wei Shen Chen
Proceedings Volume 12325, 123250T (2022) https://doi.org/10.1117/12.2640527
KEYWORDS: Photomasks, Raster graphics, Reticles

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