Ms. Elena Cong Profile

Elena Cong

at Semiconductor Manufacturing International Corp.

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Publications (2)

Proceedings Article | 26 September 2019 Paper

Resist-slope aware modeling for mask process correction applications

Rachit Sharma, Ingo Bork, Kushlendra Mishra, ShiZhi Lyu, Linna Cong, Mingjing Tian, Malavika Sharma, Bhardwaj Durvasula, Nageswara Rao, Peter Buck

Proceedings Volume 11148, 111480G (2019) https://doi.org/10.1117/12.2536529

KEYWORDS: Process modeling, Photomasks, Etching, Critical dimension metrology, Calibration, Semiconductor manufacturing, Control systems, Model-based design, Scattering, Photoresist processing

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Proceedings Article | 3 October 2018 Paper

Pattern edge roughness study on OMOG mask repair

Xuefei Qin, Jie Wang, Irene Shi, Fen Xue, Alan Li, Wenjun Ling, Linna Cong

Proceedings Volume 10810, 108100Z (2018) https://doi.org/10.1117/12.2501753

KEYWORDS: Plasma, Etching, Edge roughness, Oxides, Photomasks, Oxygen, Distortion, Plasma etching

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