Fumio Aramaki
at Hitachi High-Tech Corp
SPIE Involvement:
Author
Area of Expertise:
Focused Ion Beam (FIB) , Gas Field Ion Source (GFIS) , Photomask Repair
Publications (11)

Proceedings Article | 21 October 2014 Paper
Proceedings Volume 9235, 92350F (2014) https://doi.org/10.1117/12.2069435
KEYWORDS: Photomasks, Etching, Scanning electron microscopy, Ions, Quartz, Semiconducting wafers, Critical dimension metrology, Phase shifts, Nitrogen

Proceedings Article | 2 July 2013 Paper
Proceedings Volume 8441, 84410O (2013) https://doi.org/10.1117/12.1000135
KEYWORDS: Photomasks, Etching, Image processing, Raster graphics, Laser applications, Sensors, Ions, Optical testing, Tantalum, Barium

Proceedings Article | 30 June 2012 Paper
Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Osamu Takaoka, Yasuhiko Sugiyama, Hiroshi Oba, Kazuo Aita, Anto Yasaka
Proceedings Volume 8441, 84410D (2012) https://doi.org/10.1117/12.981167
KEYWORDS: Etching, Critical dimension metrology, Photomasks, Ions, Quartz, Image resolution, Atomic force microscopy, Extreme ultraviolet, Ion beams, Scanning electron microscopy

Proceedings Article | 7 April 2011 Paper
Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Tomokazu Kozakai, Yasuhiko Sugiyama, Hiroshi Oba, Anto Yasaka, Tsuyoshi Amano, Hiroyuki Shigemura, Osamu Suga
Proceedings Volume 7969, 79691C (2011) https://doi.org/10.1117/12.879609
KEYWORDS: Extreme ultraviolet lithography, Ions, Etching, Extreme ultraviolet, Silicon, Image resolution, Reflectivity, Ion beams, Mirrors, Ruthenium

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782323 (2010) https://doi.org/10.1117/12.864213
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Cadmium sulfide, Image processing, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Carbon, Ions

Showing 5 of 11 publications
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