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Hu Wang
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Publications (1)
Proceedings Article | 20 February 2009 Paper
High quality AlN films grown by pulsed atomic-layer epitaxy
Hu Wang, Ruofei Xiang, Qiang Zhang, Jiangnan Dai, Qinghua He, Zhihao Wu, Changqing Chen
Proceedings Volume 7279, 72791J (2009) https://doi.org/10.1117/12.823268
KEYWORDS: Aluminum nitride, Aluminum, Epitaxy, Metalorganic chemical vapor deposition, Sapphire, Atomic force microscopy, Optoelectronics, Crystals, Quantum wells, X-ray diffraction
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