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Jinwei Pan
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Publications (1)
Proceedings Article | 1 August 2023 Paper
Fast mask optimization based on self-calibrated convolutions
Proceedings Volume 12747, 127470E (2023) https://doi.org/10.1117/12.2689153
KEYWORDS: Source mask optimization, Calibration, Convolution, Lithography, Mathematical optimization, Education and training, Imaging systems, Semiconducting wafers, Image processing, Optics manufacturing
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