Mr. Junghwan Moon Profile

Junghwan Moon

at Seoul National Univ

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Author

Publications (3)

Proceedings Article | 25 March 2019 Presentation + Paper

Multiscale approach for modeling EUV patterning of chemically amplified resist

Hyungwoo Lee, Muyoung Kim, Junghwan Moon, Sungwoo Park, Byunghoon Lee, Changyoung Jeong, Maenghyo Cho

Proceedings Volume 10960, 1096008 (2019) https://doi.org/10.1117/12.2514840

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Chemically amplified resists, Photoresist materials, Optical lithography

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Proceedings Article | 19 March 2018 Paper

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10583, 1058323 (2018) https://doi.org/10.1117/12.2296494

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Photoresist materials, Line edge roughness, Electrons, Molecules, Finite difference methods

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Proceedings Article | 24 March 2017 Paper

Computational approach on PEB process in EUV resist: multi-scale simulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10143, 101432E (2017) https://doi.org/10.1117/12.2266540

KEYWORDS: Extreme ultraviolet lithography, Computer simulations, Photoresist processing, Line edge roughness, Chemical reactions, Photoresist materials, Photochemistry, Semiconductors, Photoresist developing, Diffusion, Molecules, Electrons, Polymers, Monte Carlo methods

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