CONFERENCE PROCEEDINGS
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Karthik Boinapally
at Precitec
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Publications (4)
SPIE Journal Paper | 16 October 2014
Scatterometry performance enhancement by holistic approach
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching
Proceedings Article | 2 April 2014 Paper
Scatterometry performance improvement by parameter and spectrum feed-forward
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour
Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers
Proceedings Article | 2 April 2014 Paper
Enhanced optical CD metrology by hybridization and azimuthal scatterometry
Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu
Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165
KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling
Proceedings Article | 23 July 2008 Paper
Hard infrared black coating with very low outgassing
Paul Kuzmenko, Daniel Behne, T. Casserly, W. Boardman, D. Upadhyaya, K. Boinapally, M. Gupta, Y. Cao
Proceedings Volume 7018, 701852 (2008) https://doi.org/10.1117/12.788006
KEYWORDS: Coating, Reflectivity, Infrared radiation, Cryogenics, Plasma, Photons, Infrared coatings, Plasma enhanced chemical vapor deposition, Sensors, Carbon monoxide
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