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Keith F. Best
Director Photolithography at Rudolph Technologies Inc
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Publications (1)
Proceedings Article | 1 July 2002 Paper
Three-dimensional metrology in MEMS applications
Alexander Friz, Keith Best, Satinderpall Pannu, Jocelyn Nee
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472299
KEYWORDS: Optical alignment, Semiconducting wafers, Metrology, Overlay metrology, Microelectromechanical systems, Scanning electron microscopy, Lithography, Reticles, 3D metrology, Manufacturing
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