Mr. Kosuke Ishikiriyama Profile

Kosuke Ishikiriyama

at Intel Kabushiki Kaisha

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Publications (2)

Proceedings Article | 19 May 2008 Paper

EUV mask process development status for full field EUV exposure tool

Tsukasa Abe, Takashi Adachi, Hideo Akizuki, Hiroshi Mohri, Naoya Hayashi, Kosuke Ishikiriyama

Proceedings Volume 7028, 70281Q (2008) https://doi.org/10.1117/12.793068

KEYWORDS: Photomasks, Etching, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Ruthenium, Optical lithography, Photoresist processing, Dry etching, Inspection

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Proceedings Article | 30 October 2007 Paper

Development of EUV mask fabrication process using Ru capping blank

Tsukasa Abe, Takashi Adachi, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Kosuke Ishikiriyama

Proceedings Volume 6730, 67305N (2007) https://doi.org/10.1117/12.747722

KEYWORDS: Extreme ultraviolet, Etching, Ruthenium, Reflectivity, Photomasks, Mask making, Inspection, Optical lithography, Line edge roughness, Scanning electron microscopy

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