KEYWORDS: Thin films, Microscopes, Metrology, Thin film solar cells, Thin film devices, Atomic force microscopy, Transmission electron microscopy, Phase measurement, Laser interferometry, Transistors
A transmission-mode high sensitivity quantitative phase microscope (QPM) is developed for profiling transparent thin film structures. The QPM system is implemented with a common-path interferometry design and a high well-depth camera, which has allowed us to achieve an optical path length difference sensitivity of around 50 picometers. A frame averaging method can be used to further improve the sensitivity. To account for multiple interference within thin films, a transmission matrix model is developed to achieve accurate height profile reconstruction. With the correction model, the profiling accuracy can be improved from 20.6% to 4.0% for a MoS2 thin film with a thickness of around 25 nm.
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