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Linna Cong
at Semiconductor Manufacturing International Corp
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Publications (1)
Proceedings Article | 26 September 2019 Paper
Investigation of reducing mask writing time with shot count management solution
Linna Cong, Shizhi Lyu, Mingjing Tian, Feng Liu, Min Zhang, Zexi Deng, Chunli Zhang, Ming Chen
Proceedings Volume 11148, 1114810 (2019) https://doi.org/10.1117/12.2529862
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, Data modeling, Optical alignment, Data analysis, Mask making, Error analysis, Tolerancing
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