Dr. Lynne Gignac
at IBM TJ Watson Research Ctr
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 9 April 2024 Presentation + Paper
Juliano Borges, Hongwen Yan, Devi Koty, Sophia Rogalskyj, Lynne Gignac, Leonidas Ocola, Marinus Hopstaken, Steve Molis, Andrew Simon, John Arnold, Jeffrey Shearer, Robert Bruce
Proceedings Volume 12958, 129580E (2024) https://doi.org/10.1117/12.3010015
KEYWORDS: Etching, Plasmas, Mixtures, Argon, Iridium, Chlorine, Chemistry, Thin films, Silicon

Proceedings Article | 25 May 2022 Presentation + Paper
L. Buzi, D. Koty, M. Hopstaken, J. Bruley, L. Gignac, M. Sagianis, D. Farmer, H. Miyazoe, A. Mosden, S. Engelmann, R. Bruce
Proceedings Volume 12056, 1205609 (2022) https://doi.org/10.1117/12.2614303
KEYWORDS: Plasma, Etching, Plasma enhanced chemical vapor deposition, Oxygen, Argon, Refractive index, Hydrogen, FT-IR spectroscopy, Wet etching

Proceedings Article | 25 March 2016 Paper
HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn
Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544
KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

Proceedings Article | 2 April 2014 Paper
Shimon Levi, Ishai Schwarzband, Yakov Weinberg, Roger Cornell, Ofer Adan, Guy Cohen, Lynne Gignac, Sarunya Bangsaruntip, Sean Hand, Jason Osborne, Adam Feinstein
Proceedings Volume 9050, 905008 (2014) https://doi.org/10.1117/12.2047031
KEYWORDS: Atomic force microscopy, Metrology, 3D metrology, Silicon, Semiconducting wafers, Scanning electron microscopy, Data modeling, 3D modeling, Calibration, Nanowires

SPIE Journal Paper | 25 September 2013
Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Lynne Gignac, James Bucchignano, David Klaus, Christopher Breslin, Eric Joseph, Joy Cheng, Daniel Sanders, Michael Guillorn, Chi-Chun Liu
JM3, Vol. 12, Issue 04, 041305, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041305
KEYWORDS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly

Showing 5 of 9 publications
Conference Committee Involvement (1)
Scanning Microscopies 2015
29 September 2015 | Monterey, California, United States
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