In this paper, we report a design and fabrication of MEMS electrostatically tunable Fabry-Perot (METFP) cavity sensor.
The mirror of METFP sensor is fabricated by SU-8 photoresist for the first time. The sensor is the combination of optical
fiber and microelectromechanical systems (MEMS) technologies. The voltage sensitivity of METFP is 0.036 nm/V and
the resolution of voltage measurement is 0.277 V.
Many applications in micro and nanotechnologies require micron-sized components, capable of positioning in
ranges of sub-micrometers to a few microns. This paper reports on the design, fabrication and characterization procedure
of an electrostatically actuated polymeric Nano-precision micro z-stage. Due to its ease of fabrication and great variety
of functionalities, polymers have become an important material in micro fabrication technology. In contrast to
piezoelectric stages, polymeric micro stage has a comparatively simple and cost effective fabrication procedure.
Furthermore, low Young's Modulus of polymers made them a suitable basic material in comparison with their traditional
counterparts. In this paper, SU-8 photoresist was used as the construction material and the photolithography technique
were used to realize the stage. SU-8 with its low Young's modulus (5 GPa), has a higher tendency for bending,
compared to, for example, silicon nitride (150-350 GPa). These properties make the SU-8 polymer, suitable for various
applications.
In this paper we have explained a new method for measuring the cantilever displacement using both reflective
and interferometric properties of the cantilever. In our method, a Laser light is shone on the cantilever, and the reflected
pattern is monitored by a commercially available CCD. Due to the micrometer dimensions of the cantilever which was
smaller than the spot size of the laser, the laser beam would be reflected by both substrate and the cantilever's surface,
and this will produce an interference pattern on the screen. In this configuration, a displacement in the cantilever will
reflect the light in a different angle and also changes the optical path difference between the reflected light from the
cantilever and substrate. The overall result of these two effects would be a total displacement of the pattern, which could
be simply measured using a CCD. Finally, by taking both effects into consideration,, the cantilever's displacement could
be measured. For testing this technique different cantilevers were fabricated and were electrostatically actuated. In this
method, displacements as small as 10nm were possible to measure.
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