Manvendra Chauhan
at Indian Institute of Technology Mandi
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11612, 1161208 (2021) https://doi.org/10.1117/12.2583850

Proceedings Article | 26 March 2020 Presentation + Paper
Proceedings Volume 11326, 1132604 (2020) https://doi.org/10.1117/12.2552189
KEYWORDS: Electron beam lithography, Nickel, Metals, Etching, Line edge roughness, Line width roughness, Silicon, Helium, Resistance, Thin films

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