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Mark Hrdy
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Publications (1)
Proceedings Article | 13 June 2022 Poster
Effect of initial conditions on uniformity of metal assisted chemical etch for ultra-high aspect ratio, taper-free silicon nanostructures
Akhila Mallavarapu, Mark Hrdy, Mariana Castaneda, Paras Ajay, S.V. Sreenivasan
Proceedings Volume PC12056, PC120560C (2022) https://doi.org/10.1117/12.2604283
KEYWORDS: Etching, Silicon, Metals, Nanostructures, Wet etching, Plasma etching, Optical lithography, Transistors, Sensors, Semiconductors
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