The feasibility of removing defects from the surface of extreme ultraviolet (EUV) substrates by nanomachining is being
investigated. A commercially available atomic force microscope (AFM) based photomask repair tool was used. A
specific class of defects which has resisted all other removal techniques was targeted. Three AFM probes of varying
sharpness were evaluated. All of the probes removed the majority of each but fell short of achieving the desired 2006
high spatial frequency roughness specification of 0.2nm. Results reported are preliminary; future work will focus on
optimization of scanning parameters and tip geometry targeting specific residual defects reported in the text.
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