The structuring of optical substrates gained more significance than ever before and many current and future applications challenge common production processes in respect to either grating or substrate geometry. Reactive ion beam etching (RIBE) offers the flexibility to etch blazed, binary or slanted gratings with varying dimensional parameters in flat but also curved substrates. This contribution’s focus is to demonstrate how RIBE can be adapted to various applications by tailoring the etching process or the etching tool to meet specific grating requirements.
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