Dr. Rajesh L. Patel Profile

Dr. Rajesh L. Patel

at Element Six (UK) Ltd

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 8 March 2023 Presentation + Paper

Control of strain in thin diamond nitrogen-vacancy layers for magnetometry applications

Teodoro Graziosi, Adam Rathmill, Rajesh Patel, Nicola Palmer, Andrew Edmonds, Matthew Markham, Daniel Twitchen

Proceedings Volume 12447, 124470F (2023) https://doi.org/10.1117/12.2649676

KEYWORDS: Raman spectroscopy, Diamond, Magnetism, Surface finishing, Polishing

Read Abstract +

NV-based magnetometry in single-crystal diamond grown by chemical vapour deposition (CVD), is now a wellestablished technology with demonstrated applications in DC and AC bulk magnetometry. The approx. 500 µm thick plates normally used offer limited contrast when attempting to measure the magnetic properties of small samples (for example biological samples or minerals) placed in proximity of the diamond magnetic sensor. Such applications would benefit from a few µm high-[NV] layer on a low luminescence substrate in order to collect the signal only from NV centres spatially close to the area of interest, allowing the formation of a magnetic image with increased resolution. It is important to ensure that the strain in the high-[NV] layer is spatially uniform and low in magnitude, to preserve the magnetic resolution and to avoid unusable regions on the magnetic sensor. Established techniques to manage strain during CVD diamond growth are not applicable for the deposition of a few µm of material; normally, the substrate would undergo extensive plasma etching to remove contaminants and polishing damage from the surface of the substrate. This is not possible for thin layers, since the etching would increase the roughness and produce NV layers with non-uniform thickness. Here, we present recent developments to obtain thin, high-[NV] layers on high purity substrates with large areas of low strain, by discussing the substrate preparation and strain characterisation before and after growth.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years