Seung-Bin Yang
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 April 2023 Presentation + Paper
Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren
Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719
KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676
KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

Proceedings Article | 20 March 2020 Presentation + Paper
Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara
Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246
KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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