Mr. Stephen J. Buffat Profile

Stephen J. Buffat

Staff Research Scientist at Lockheed Martin

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Author

Publications (2)

Proceedings Article | 11 June 1999 Paper

Evaluation of electron beam stabilization for ion implant processing

Stephen Buffat, Bee Kickel, B. Philipps, J. Adams, Matthew Ross, Jason Minter, Trey Marlowe, Selmer Wong

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350167

KEYWORDS: Semiconducting wafers, Photoresist materials, Electron beams, Deep ultraviolet, Ions, Photoresist processing, Scanning electron microscopy, Silicon, Oxides, Photomasks

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Proceedings Article | 7 July 1997 Paper

Non-ARC solution to metal reflective notching: its evaluation and selection

Stephen Buffat

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276029

KEYWORDS: Reflectivity, Metals, Photoresist materials, Aluminum, Resist chemistry, Optical lithography, Manufacturing, Interfaces, Absorption, Wafer manufacturing

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Conference Committee Involvement (1)

Data Analysis and Modeling for Patterning Control III

23 February 2006 | San Jose, California, United States

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