Mr. Takumi Yoshino Profile

Takumi Yoshino

at Toyo Gosei Co Ltd

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Author

Publications (2)

Proceedings Article | 25 March 2019 Paper

Improvement of dual insolubilization resist performance through the incorporation of various functional units

Satoshi Enomoto, Takumi Yoshino, Kohei Machida, Takahiro Kozawa

Proceedings Volume 10960, 109600D (2019) https://doi.org/10.1117/12.2515149

KEYWORDS: Polymers, Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Semiconducting wafers, Diffusion, Line width roughness, Chemically amplified resists, Stochastic processes, Head-mounted displays

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Proceedings Article | 13 March 2018 Paper

Study of electron beam and extreme ultraviolet resist utilizing polarity change and radical crosslinking

Satoshi Enomoto, Takumi Yoshino, Kohei Machida, Takahiro Kozawa

Proceedings Volume 10586, 105860H (2018) https://doi.org/10.1117/12.2297392

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Electron beams, Chemically amplified resists, Lithography, Absorption, Diffusion, Line width roughness, Molecules

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