Tetsuhiko Mizusaka
at Mitsubishi Gas Chemical Co Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94251R (2015) https://doi.org/10.1117/12.2083755
KEYWORDS: Extreme ultraviolet lithography, Polymers, Line edge roughness, Extreme ultraviolet, Lithography, Photoresist materials, Optical lithography, Diffusion, Statistical modeling, Photopolymers

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