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Toru Yamaguchi
at NTT Basic Research Labs
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 12 June 2003 Paper
Molecular weight effect on line-edge roughness
Toru Yamaguchi, Kenji Yamazaki, Hideo Namatsu
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485049
KEYWORDS: Line edge roughness, Polymers, Polymer thin films, Surface roughness, Molecular aggregates, Atomic force microscopy, Lithography, Scanning electron microscopy, Molecules, Electron beams
Proceedings Article | 24 July 2002 Paper
Generation mechanism of surface roughness in resists: free volume effect on surface roughness
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474165
KEYWORDS: Surface roughness, Molecular aggregates, Polymers, Molecules, Line edge roughness, Atomic force microscopy, Atomic force microscope, Photoresist processing, Polymer thin films, Image processing
Proceedings Article | 11 June 1999 Paper
Spin-coatable Al2O3 resists in electron-beam nanolithography
Mohammad Saifullah, Hideo Namatsu, Toru Yamaguchi, Kenji Yamazaki, Kenji Kurihara
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350248
KEYWORDS: Electron beams, Absorption, FT-IR spectroscopy, Nanolithography, Aluminum, Metals, Silicon, Scanning electron microscopy, Silicon films, Humidity
Proceedings Article | 11 June 1999 Paper
Line-edge roughness characterized by polymer aggregates in photoresists
Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Kurihara, Yoshio Kawai
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350246
KEYWORDS: Polymers, Line edge roughness, Polymer thin films, Surface roughness, Atomic force microscopy, Photoresist materials, Photoresist developing, Lithography, Deep ultraviolet, Atomic force microscope
Proceedings Article | 29 June 1998 Paper
New development model: aggregate extraction development
Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki, Kenji Kurihara
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312432
KEYWORDS: Polymers, Polymer thin films, Molecules, Molecular aggregates, Atomic force microscopy, Scanning electron microscopy, Electron beams, Diffusion, Lithography, Photoresist processing
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