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Vincent Gizzo
at Tokyo Electron America Inc
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Author
Publications (1)
Proceedings Article | 28 March 2014 Paper
Precision integrated thickness control with gas cluster ion beam etch
N. Russell, V. Gizzo, J. LaRose, B. Pfeiffer, R. Dasaka, L. Economikos, R. Wise
Proceedings Volume 9054, 90540I (2014) https://doi.org/10.1117/12.2043658
KEYWORDS: Etching, Semiconducting wafers, Ion beams, Process control, Metrology, Control systems, Molecules, CMOS technology, Molecular interactions
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