Dr. Wayne Zhou Profile

Dr. Wayne Zhou

at KLA Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 27 April 2023 Poster + Paper

Residuals reduction in imaging-based overlay using color per layer

Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar

Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681

KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

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Proceedings Article | 27 April 2023 Poster + Paper

ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control

Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi

Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632

KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators

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Proceedings Article | 27 April 2023 Presentation + Paper

Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi

Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678

KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing

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Proceedings Article | 26 May 2022 Presentation + Paper

Overlay stability control in IBO measurement using rAIM target

Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120530E (2022) https://doi.org/10.1117/12.2608053

KEYWORDS: Overlay metrology, Process control, Optical lithography, Metrology, Inspection, Semiconducting wafers, Data modeling, Wafer-level optics, Optical properties, Optical design

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Proceedings Article | 20 March 2020 Paper

OPO residuals improvement with imaging metrology for 3D NAND

Shlomit Katz, Anna Golotsvan, Yoav Grauer, Efi Megged, Greg Gray, Fiona (Shuk Fan) Leung, Pek Beng Ong, Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou, Linfei Gao

Proceedings Volume 11325, 113252J (2020) https://doi.org/10.1117/12.2551874

KEYWORDS: Overlay metrology, Semiconducting wafers, 3D acquisition, 3D image processing, Imaging metrology, Scanning electron microscopy, Optimization (mathematics), Photovoltaics

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Proceedings Article | 26 March 2019 Paper

Improved accuracy and robustness for advanced DRAM with tunable multi-wavelength imaging and scatterometry overlay metrology

Honggoo Lee, Sangjun Han, Minhyung Hong, Jieun Lee, Dongyoung Lee, Ahlin Choi, Chanha Park, Dohwa Lee, Seongjae Lee, Jungtae Lee, Jeongpyo Lee, DongSub Choi, Sanghuck Jeon, Zephyr Liu, Hao Mei, Tal Marciano, Eitan Hajaj, Lilach Saltoun, Dana Klein, Eran Amit, Anna Golotsvan, Wayne Zhou, Eitan Herzel, Roie Volkovich, John Robinson

Proceedings Volume 10959, 109591E (2019) https://doi.org/10.1117/12.2515015

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scatterometry, Wafer-level optics, Manufacturing, Quality measurement, Imaging systems, Scanning electron microscopy, Diffractive optical elements

Read Abstract +

Overlay process control is a critical aspect of integrated circuit manufacturing. Advanced DRAM manufacturing overlay error budget approaches the sub-2nm threshold, including all sources of overlay error: litho processing, non-litho processing, metrology error, etc. Overlay measurement quality, both for accuracy and robustness, depends on the metrology system and its recipe setup. The optimal configuration depends on the layer and materials involved. Increased flexibility of metrology setup is of paramount importance, paired with improved methods of recipe optimization.

Both optical image-based overlay (IBO) and scatterometry diffraction overlay (SCOL®) are necessary tools for overlay control. For some devices and layers IBO provides the best accuracy and robustness, while on others SCOL provides optimum metrology. Historically, wavelength selection was limited to discrete wavelengths and at only a single wavelength. At advanced nodes IBO and SCOL require wavelength tunability and multiple wavelengths to optimize accuracy and robustness, as well as options for polarization and numerical aperture (NA). In previous studies^1,2,3 we investigated wavelength tunability analysis with landscape analysis, using analytic techniques to determine the optimal setup. In this report we show advancements in the landscape analysis technique for IBO through both focus and wavelength, and comparisons to SCOL. A key advantage of imaging is the ability to optimize wavelength on a per-layer basis. This can be a benefit for EUV layers in combination with those of 193i, for example, as well as other applications such as thick 3D NAND layers. The goal is to make accurate and robust overlay metrology that is immune from process stack variations, and to provide metrics that indicate the quality of metrology performance. Through both simulation and on-wafer advanced DRAM measurements, we show quantitative benefits of accuracy and robustness to process stack variability for IBO and SCOL applications.

Methodologies described in this work can be achieved using Archer™ overlay metrology systems, ATL™ overlay metrology systems, and 5D Analyzer® advanced data analysis and patterning control solution.

Showing 5 of 6 publications

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