Dr. Wen-Chun Huang Profile

Dr. Wen-Chun Huang

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 19 March 2015 Paper

Simulation of AIMS measurements using rigorous mask 3D modeling

Chih-Shiang Chou, Hsu-Ting Huang, Fu-Sheng Chu, Yuan-Chih Chu, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9424, 94241A (2015) https://doi.org/10.1117/12.2085113

KEYWORDS: Photomasks, 3D modeling, Inspection, Diffraction, 3D metrology, Semiconducting wafers, 3D image processing, Calibration, Scattering, Wafer inspection

Read Abstract +

Proceedings Article | 31 March 2014 Paper

Resist profile simulation with fast lithography model

Yan-Ying He, Chih-Shiang Chou, Yu-Po Tang, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9052, 90520Y (2014) https://doi.org/10.1117/12.2045538

KEYWORDS: 3D modeling, Scanning electron microscopy, Diffusion, Data modeling, Lithography, Calibration, Semiconducting wafers, Visual process modeling, 3D image processing, Optical proximity correction

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Joint calibration of 3D resist image and CDSEM

C. S. Chou, Y. Y. He, Y. P. Tang, Y. T. Chang, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8681, 868113 (2013) https://doi.org/10.1117/12.2010846

KEYWORDS: 3D modeling, Scanning electron microscopy, Photoresist materials, Diffusion, Calibration, Critical dimension metrology, Performance modeling, 3D image processing, Optical proximity correction, Lithography

Read Abstract +

Proceedings Article | 14 March 2012 Paper

Building 3D aerial image in photoresist with reconstructed mask image acquired with optical microscope

C. S. Chou, Y. P. Tang, F. S. Chu, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 83261L (2012) https://doi.org/10.1117/12.917794

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, 3D image reconstruction, Photoresist materials, Scanning electron microscopy, Reflection, Calibration, Refraction, 3D acquisition

Read Abstract +

Proceedings Article | 13 March 2012 Paper

Multiple-image-depth modeling for hotspot and AF printing detections

Y. P. Tang, C. S. Chou, W. C. Huang, R. G. Liu, T. S. Gau

Proceedings Volume 8326, 832619 (2012) https://doi.org/10.1117/12.917402

KEYWORDS: Printing, Optical proximity correction, Atrial fibrillation, Calibration, Semiconducting wafers, Data modeling, 3D modeling, SRAF, Scanning electron microscopy, Cadmium

Read Abstract +

Proceedings Article | 16 March 2009 Paper

OPC segmentation: dilemma between degree-of-freedom and stability with some relieves

Y. P. Tang, J. H. Feng, M. H. Chih, C. K. Tsai, W. C. Huang, C. C. Kuo, R. G. Liu, H. T. Lin, Y. C. Ku

Proceedings Volume 7274, 72742G (2009) https://doi.org/10.1117/12.814907

KEYWORDS: Optical proximity correction, Image segmentation, Optical lithography, Resolution enhancement technologies, Lithographic illumination, Detection and tracking algorithms, Neodymium, Semiconductor manufacturing, Immersion lithography, Photomasks

Read Abstract +

Proceedings Article | 19 March 2008 Paper

Layout patterning check for DFM

C. C. Chang, I. C. Shih, J. F. Lin, Y. S. Yen, C. M. Lai, W. C. Huang, R. G. Liu, Y. C. Ku

Proceedings Volume 6925, 69251R (2008) https://doi.org/10.1117/12.775420

KEYWORDS: Lithography, Design for manufacturing, Nanoimprint lithography, Optical lithography, Manufacturing, Design for manufacturability, Critical dimension metrology, Model-based design, Semiconducting wafers, Inspection

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Pellicle effect on OPC modeling

Boren Luo, Chi-Kang Chang, W. Wang, W. Huang, Timothy Wu, C. Lai, R. Liu, H. Lin, K. Chen, Y. Ku

Proceedings Volume 6924, 69243T (2008) https://doi.org/10.1117/12.775419

KEYWORDS: Pellicles, Optical proximity correction, Photomasks, Data modeling, Polarization, Immersion lithography, Projection systems, Diffraction, Signal attenuation, Critical dimension metrology

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Patterning effect and correlated electrical model of post-OPC MOSFET devices

Y. C. Cheng, T. H. Ou, M. H. Wu, W. L. Wang, J. H. Feng, W. C. Huang, C. M. Lai, R. G. Liu, Y. C. Ku

Proceedings Volume 6521, 65210G (2007) https://doi.org/10.1117/12.717254

KEYWORDS: Optical lithography, Instrument modeling, Data modeling, Critical dimension metrology, Transistors, Field effect transistors, Manufacturing, Design for manufacturing, Silicon, Lithography

Read Abstract +

Proceedings Article | 20 March 2006 Paper

Intelligent model-based OPC

W.C. Huang, C.M. Lai, B. Luo, C.K. Tsai, M.H. Chih, C.W. Lai, C.C. Kuo, R.G. Liu, H.T. Lin

Proceedings Volume 6154, 615436 (2006) https://doi.org/10.1117/12.657792

KEYWORDS: Optical proximity correction, Lithography, Genetic algorithms, Model-based design, Optimization (mathematics), Artificial neural networks, Image segmentation, Neural networks, Semiconducting wafers, Systems modeling

Read Abstract +

Optical proximity correction is the technique of pre-distorting mask layouts so that the printed patterns are as close to the desired shapes as possible. For model-based optical proximity correction, a lithographic model to predict the edge position (contour) of patterns on the wafer after lithographic processing is needed. Generally, segmentation of edges is performed prior to the correction. Pattern edges are dissected into several small segments with corresponding target points. During the correction, the edges are moved back and forth from the initial drawn position, assisted by the lithographic model, to finally settle on the proper positions. When the correction converges, the intensity predicted by the model in every target points hits the model-specific threshold value. Several iterations are required to achieve the convergence and the computation time increases with the increase of the required iterations. An artificial neural network is an information-processing paradigm inspired by biological nervous systems, such as how the brain processes information. It is composed of a large number of highly interconnected processing elements (neurons) working in unison to solve specific problems. A neural network can be a powerful data-modeling tool that is able to capture and represent complex input/output relationships. The network can accurately predict the behavior of a system via the learning procedure. A radial basis function network, a variant of artificial neural network, is an efficient function approximator. In this paper, a radial basis function network was used to build a mapping from the segment characteristics to the edge shift from the drawn position. This network can provide a good initial guess for each segment that OPC has carried out. The good initial guess reduces the required iterations. Consequently, cycle time can be shortened effectively. The optimization of the radial basis function network for this system was practiced by genetic algorithm, which is an artificially intelligent optimization method with a high probability to obtain global optimization. From preliminary results, the required iterations were reduced from 5 to 2 for a simple dumbbell-shape layout.

Proceedings Article | 12 May 2005 Paper

OPC modeling by genetic algorithm

W. Huang, C. Lai, B. Luo, C. Tsai, C. Tsay, C. Kuo, R. Liu, H. Lin, B. Lin

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602096

KEYWORDS: Optical proximity correction, Lithography, Wafer-level optics, Genetic algorithms, Model-based design, Data modeling, Optimization (mathematics), Optical lithography, Photomasks, Semiconducting wafers

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Two threshold resist models for optical proximity correction

Wen-Chun Huang, Chia-Hui Lin, Chin-Chen Kuo, C. Huang, J. Lin, Jeng-Horng Chen, Ru-Gun Liu, Yao Ku, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544252

KEYWORDS: Optical proximity correction, Data modeling, Optical lithography, Photoresist processing, Chemical reactions

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years