Mr. Yasutaka Kikuchi Profile

Yasutaka Kikuchi

Manager at Toppan Photomasks Inc

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 19 May 2011 Paper

Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Paper

Influence of the charging effect on the precision of measuring EUV mask features

Yasushi Nishiyama, Hidemitsu Hakii, Isao Yonekura, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 7971, 79710C (2011) https://doi.org/10.1117/12.878728

KEYWORDS: Electrons, Extreme ultraviolet, Silica, Monte Carlo methods, Photomasks, Tantalum, Scanning electron microscopy, Critical dimension metrology, Multilayers, Scattering

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Proceedings Article | 20 April 2011 Paper

Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 17 October 2008 Paper

Paper

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Thomas Faure, Emily Gallagher, Michael Hibbs, Louis Kindt, Ken Racette, Richard Wistrom, Amy Zweber, Alfred Wagner, Yasutaka Kikuchi, Toru Komizo, Satoru Nemoto

Proceedings Volume 7122, 712209 (2008) https://doi.org/10.1117/12.801950

KEYWORDS: Photomasks, Binary data, Opacity, Chromium, Etching, Photoresist processing, Critical dimension metrology, Quartz, Phase shifts, Mask making

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Proceedings Article | 30 October 2007 Paper

Paper

Development and characterization of a new low stress molybdenum silicide film for 45 nm attenuated phase-shift mask manufacturing

Thomas Faure, Emily Gallagher, Louis Kindt, Steven Nash, Ken Racette, Richard Wistrom, Toru Komizo, Yasutaka Kikuchi, Satoru Nemoto, Yushin Sasaki, Atsushi Kominato, Toshiyuki Suzuki

Proceedings Volume 6730, 67300C (2007) https://doi.org/10.1117/12.748664

KEYWORDS: Photomasks, Etching, Distortion, Manufacturing, Line edge roughness, Photoresist processing, Dry etching, Image processing, Transmittance, Opacity

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Proceedings Article | 15 May 2007 Paper

Paper

Impact of transmitted and reflected light inspection on mask inspectability, defect sensitivity, and mask design rule restrictions

Yutaka Kodera, Karen Badger, Emily Gallagher, Shinji Akima, Mark Lawliss, Hidehiro Ikeda, Ian Stobert, Yasutaka Kikuchi

Proceedings Volume 6607, 66072E (2007) https://doi.org/10.1117/12.728997

KEYWORDS: Inspection, Photomasks, Opacity, Optical proximity correction, SRAF, Semiconducting wafers, Defect inspection, Defect detection, Image quality, Manufacturing

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Proceedings Article | 14 May 2007 Paper

Paper

Pellicle factors affecting finished photomask flatness

K. Racette, A. Watts, M. Barrett, R. Nolan, Y. Sasaki, Y. Kikuchi, T. Matsumura

Proceedings Volume 6607, 66071V (2007) https://doi.org/10.1117/12.728978

KEYWORDS: Pellicles, Photomasks, Adhesives, Distortion, Platinum, Manufacturing, Optical lithography, Optics manufacturing, Electronics, Printing

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Proceedings Article | 20 May 2006 Paper

Paper

Evaluating films for high transmission attenuated phase shift masks

Satoru Nemoto, Toru Komizo, Yasutaka Kikuchi, Emily Gallagher, Jason Benz, Michael Hibbs, Takashi Haraguchi

Proceedings Volume 6283, 628322 (2006) https://doi.org/10.1117/12.681767

KEYWORDS: Etching, Reflection, Quartz, Photomasks, Phase shifts, Phase measurement, Inspection, Surface roughness, Scanning electron microscopy, Radium

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Proceedings Article | 28 June 2005 Paper

Paper

Evaluation of quartz dry etching profile for the PSM lithography performance

Toru Komizo, Satoru Nemoto, Yosuke Kojima, Takashi Ohshima, Takashi Yoshii, Toshio Konishi, Kazuaki Chiba, Yasutaka Kikuchi, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617440

KEYWORDS: Quartz, Photomasks, Lithography, Etching, Semiconducting wafers, Dry etching, Phase shifts, Chromium, Scanning electron microscopy, Electromagnetism

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Proceedings Article | 17 December 2003 Paper

Paper

Mask CD uniformity improvement by dry etching loading effect correction

Jun Kotani, Toshiaki Yanagihara, Eiji Umeda, Takashi Senou, Yasutaka Kikuchi, Tsuyoshi Tanaka, Yoshimitsu Okuda

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.524430

KEYWORDS: Dry etching, Chromium, Photomasks, Data conversion, Software development, Electronics, Plasma, Photoresist processing, Data corrections, Optical proximity correction

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Proceedings Article | 17 December 2003 Paper

Paper

Mask challenges and capability development for the 65-nm device technology node: the first status report

Won Kim, Christopher Aquino, Mark Eickhoff, Phillip Lim, Nobuhiko Fukuhara, Scott Jessen, Yasutaka Kikuchi, Junichi Tanzawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518205

KEYWORDS: SRAF, Photomasks, Inspection, Resolution enhancement technologies, Printing, Solids, Lithography, Mask making, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 28 August 2003 Paper

Paper

Defect printability and inspection capability for tri-tone PSM

Yoshikazu Nagamura, Kazuyuki Maetoko, Kiyoshi Maeshima, Naohisa Tamada, Kunihiro Hosono, Masaya Fujimoto, Yutaka Kodera, Koji Goto, Tsuyoshi Narita, Fuyuhiko Matsuo, Shinji Akima, Mikio Ishijima, Hironobu Iwasaki, Yasutaka Kikuchi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504207

KEYWORDS: Inspection, Picosecond phenomena, Chromium, Calibration, Semiconducting wafers, Defect inspection, Photomasks, Defect detection, Critical dimension metrology, Phase shifts

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Proceedings Article | 28 August 2003 Paper

Paper

New repair of clear defects on half-tone PSM using Ga implantation

Yoshikazu Nagamura, Itaru Kanai, Koji Tange, Kunihiro Hosono, Koki Hayashi, Hidehiro Ikeda, Susumu Nagashige, Mikio Ishijima, Hironobu Iwasaki, Yasutaka Kikuchi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504208

KEYWORDS: Carbon, Gallium, Critical dimension metrology, Semiconducting wafers, Ions, Transmittance, Ion implantation, Image processing, Photomasks, Bridges

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Proceedings Article | 28 August 2003 Paper

Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat II

Teruhiko Kumada, Koji Tange, Kazuyuki Maetoko, Kunihiro Hosono, Masayoshi Tsuzuki, Kyoichi Yonetani, Reiji Terada, Yukio Nakashiba, Shingo Anzai, Yasutaka Kikuchi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504182

KEYWORDS: Critical dimension metrology, Photomasks, Chemically amplified resists, Manufacturing, Polymers, Photoresist processing, Coating, Diffusion, Semiconducting wafers, Molecules

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Proceedings Article | 1 August 2002 Paper

Paper

Improvement of critical dimension stability of chemically amplified resist by overcoat

Teruhiko Kumada, Atsuko Sasahara, Kazuyuki Maetoko, Kunihiro Hosono, Takemichi Honma, Yuji Kodaira, Yukio Nakashiba, Masaoshi Tsuzuki, Yasutaka Kikuchi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476955

KEYWORDS: Critical dimension metrology, Photomasks, Chemically amplified resists, Manufacturing, Photoresist processing, Polymers, Inspection, Coating, Printing, Diffusion

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Proceedings Article | 11 March 2002 Paper

Paper

Development of refined cleaning technique focusing on ecological viewpoint

Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, Hozumi Usui

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458332

KEYWORDS: Particles, Transmittance, Chromium, Water, Scanning probe microscopy, Hydrogen, Photoresist processing, Excimers, Reflectivity, Optical properties

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Proceedings Article | 5 September 2001 Paper

Paper

Development of refined cleaning technique focusing on an ecological viewpoint

Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, Hozumi Usui

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438375

KEYWORDS: Particles, Transmittance, Chromium, Scanning probe microscopy, Excimers, Water, Optical properties, Photoresist processing, Reflectivity, Industrial chemicals

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Proceedings Article | 18 December 1998 Paper

Paper

Application of HT-PSM to 180-nm logic devices

Yasutaka Kikuchi, Takashi Seno, Kensuke Kawanabe, Eiji Bunki, Yuki Otsuka, Yoshiro Yamada

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332876

KEYWORDS: Etching, Chromium, Dry etching, Reticles, Critical dimension metrology, Logic devices, Reactive ion etching, Photomasks, Binary data, Optical proximity correction

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Proceedings Article | 12 February 1997 Paper

Paper

Tritone PSM and its performance

Makoto Kohzuma, Kazuaki Chiba, Hiromasa Unno, Yasutaka Kikuchi, Yoshiro Yamada, Masao Otaki

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301197

KEYWORDS: Chromium, Semiconducting wafers, Photomasks, Halftones, Optical proximity correction, Reticles, Printing, Phase shifts, Opacity, Binary data

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Proceedings Article | 8 December 1995 Paper

Paper

Actual use of phase-shift mask

Yoshiro Yamada, Hiromasa Unno, Kazuaki Chiba, Eisei Karikawa, Yasutaka Kikuchi, Yusuke Hattori, Katsuhiro Kinemura

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228179

KEYWORDS: Chromium, Etching, Phase shifts, Dry etching, Manufacturing, Photomasks, Thin films, Reticles, Photoresist processing, Critical dimension metrology

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Proceedings Article | 3 July 1995 Paper

Paper

Quality control of embedded-type phase-shift mask

Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Hiromasa Unno, Yasutaka Kikuchi, Katsuhiro Kinemura, Masao Otaki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212785

KEYWORDS: Chromium, Phase shifts, Reticles, Photomasks, Dry etching, Inspection, Optical lithography, Critical dimension metrology, Coating, Control systems

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Showing 5 of 21 publications

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