Yu-Cheng Chang
at Powerchip Semiconductor Manufacturing Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460N (2017) https://doi.org/10.1117/12.2258201
KEYWORDS: Lithography, Photoresist materials, Etching, Optical proximity correction, Resolution enhancement technologies, Photomasks, Semiconductors, Source mask optimization, Double patterning technology, Semiconducting wafers, Radon, Computer simulations

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