From Event: SPIE Advanced Lithography + Patterning, 2024
Driving the silicon photonics technology along the journey of early development towards high volume manufacturing passes through multiple challenging stages. In this presentation I will be focusing on the challenges facing both optical proximity correction (OPC) and etch compensation for silicon photonics designs versus conventional CMOS designs.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mohamed Gheith, "An overview of curvilinear OPC algorithms for silicon photonics applications," Proc. SPIE 12954, DTCO and Computational Patterning III, 129540P (Presented at SPIE Advanced Lithography + Patterning: February 28, 2024; Published: 10 April 2024); https://doi.org/10.1117/12.3025295.6bcd54b9-43ae-ee11-a99d-88bed9489567.