4 October 2023Investigating the sensitivity of optical constant determination in the vacuum ultraviolet spectral range to s- and p-polarized reflectance
Najmeh Abbasirad,1 Udo Kroth,1 Qais Saadeh,1 Richard Ciesielski,1 Alexander Gottwald,1 Vicky Philipsenhttps://orcid.org/0000-0002-2959-432X,2 Frank Scholze,1 Victor Soltwisch,1 Mattia Mulazzi1
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Knowledge of optical constants in the vacuum ultraviolet (VUV) range is vital for the semiconductor industries to develop new materials with the required optical properties for lithography. However, the optical constants for most materials in this range are not precisely known because corresponding measurements are demanding in many regards. Measuring the s- and p-polarized reflectance for different materials from 36 nm- 220 nm, we have calculated the optical constants and studied the effect of polarization in the sensitivity of the optical constant determination in the VUV spectral range
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Najmeh Abbasirad, Udo Kroth, Qais Saadeh, Richard Ciesielski, Alexander Gottwald, Vicky Philipsen, Frank Scholze, Victor Soltwisch, Mattia Mulazzi, "Investigating the sensitivity of optical constant determination in the vacuum ultraviolet spectral range to s- and p-polarized reflectance," Proc. SPIE PC12695, Advances in Metrology for X-Ray and EUV Optics X, PC1269507 (4 October 2023); https://doi.org/10.1117/12.2681821