Recent Improvements in EUV lithography using multi-trigger resist

Carmen Popescu; Greg O'Callaghan; Alexandra McClelland; Catherine Storey; John Roth; Edward A. Jackson; Alex P. G. Robinson

doi:10.1117/12.2687325

22 November 2023 Recent Improvements in EUV lithography using multi-trigger resist

Carmen Popescu, Greg O'Callaghan, Alexandra McClelland, Catherine Storey, John Roth, Edward A. Jackson, Alex P. G. Robinson

Author Affiliations +

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC1275007 (2023) https://doi.org/10.1117/12.2687325
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Irresistible Materials (IM) is improving its Multi-Trigger Resist – a negative tone, high opacity molecular resist specifically designed for high speed EUV, and high-NA EUV lithography, capable of patterning well with thin films. Pitch 28nm dense patterns can be patterned at a dose of 32mJ/cm2, a line width of 12.0nm, and a biased LWR of 3.9nm. This resist formulation has also been used to pattern pillars at pitches of 34nm hexagonal with a dose of 42mJ/cm2 to achieve 17nm diameter pillars. P32 pillars have also been patterned with a dose of 76 mJ/cm2 and biased LCDU of 3.4nm.

Conference Presentation

Citation Download Citation

Carmen Popescu, Greg O'Callaghan, Alexandra McClelland, Catherine Storey, John Roth, Edward A. Jackson, and Alex P. G. Robinson "Recent Improvements in EUV lithography using multi-trigger resist", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275007 (22 November 2023); https://doi.org/10.1117/12.2687325

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