Computer Controlled E-Beam CC-CD System

Donald J. Evins; Stewart Spiers

doi:10.1117/12.949754

2 January 1986 Computer Controlled E-Beam CC-CD System

Donald J. Evins, Stewart Spiers

Proceedings Volume 0565, Micron and Submicron Integrated Circuit Metrology; (1986) https://doi.org/10.1117/12.949754
Event: 29th Annual Technical Symposium, 1985, San Diego, United States

Abstract

VLSI and ULSI developments aimed at sub-micron geometries require improved measuring systems. A computer controlled cassette to cassette electron beam system has been developed. High resolution of l5nm at lkV is routinely achieved with a unique 4 lens electron optical system. Through-put of the system is 10-15 wafers per hour (5 chips, 1 measurement/chip). An automatic line width measurement method with high accuracy, "The Linear Regression Method"1, has achieved an absolute accuracy of 0.009μm.

Citation Download Citation

Donald J. Evins and Stewart Spiers "Computer Controlled E-Beam CC-CD System", Proc. SPIE 0565, Micron and Submicron Integrated Circuit Metrology, (2 January 1986); https://doi.org/10.1117/12.949754

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