Thin Layer Formation Studied by Angular Dependent X-Ray Photoelectron Spectroscopy

William F. Stickle; Kenneth D. Bomben; Lillian E. Gulbrandsen; Thomas W. Rusch

doi:10.1117/12.936603

12 August 1986 Thin Layer Formation Studied by Angular Dependent X-Ray Photoelectron Spectroscopy

William F. Stickle, Kenneth D. Bomben, Lillian E. Gulbrandsen, Thomas W. Rusch

Proceedings Volume 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments; (1986) https://doi.org/10.1117/12.936603
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

Angular Dependedent X-Ray Photoelectron Spectroscopy (ADXPS) provides a method for inves-tigating thin (less than 10A) surface layers without the need for destructive depth profiling. In addition, surface chemical environments can be identified and their chemical shifts monitored as a function of angle. The ability to examine samples at very low angles (less than 10°) is important if one is to distinguish the type and extent of surface coverage. A study of passivation methods on beryllium surfaces by ADXPS shows that conventional treatments passivate the surface with a thinner oxide layer than air exposure but leave additional chemical residues. A study of thin native oxides on silicon by ADXPS was compared with different mathematical models for the surface. The experimental data for two different sample treatments could be reasonably well fit by simple models.

Citation Download Citation

William F. Stickle, Kenneth D. Bomben, Lillian E. Gulbrandsen, and Thomas W. Rusch "Thin Layer Formation Studied by Angular Dependent X-Ray Photoelectron Spectroscopy", Proc. SPIE 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments, (12 August 1986); https://doi.org/10.1117/12.936603

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